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    Automatic classification of patterned mask defects

    White Paper

    Automatic classification of patterned mask defects

    Patterned masks require requalification at wafer fabrication plants to find and fix defects that can develop over time. Unavailability of layout data complicates the tasks of identifying different pattern regions on the mask, especially assist features. Calibre fab solutions software characterizes and classifies mask defects from images reported by the inspection machine.

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